The Technology of Plasma Spray Physical Vapour Deposition
Abstract: The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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The Technology of Plasma Spray Physical Vapour Deposition ; volume:32 ; number:1 ; year:2013 ; pages:33-39
High temperature materials and processes ; 32, Heft 1 (2013), 33-39
- Creator
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Goral, Marek
Kotowski, Slawomir
Sieniawski, Jan
- DOI
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10.1515/htmp-2012-0051
- URN
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urn:nbn:de:101:1-2501270427158.468286325770
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:37 AM CEST
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Associated
- Goral, Marek
- Kotowski, Slawomir
- Sieniawski, Jan
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Materialtransfer beim LPVD-Verfahren (Laserstrahlungsunterstütztes Physical-Vapour-Deposition-Verfahren)
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