Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application ; volume:10 ; number:1 ; day:31 ; month:1 ; year:2015 ; pages:1-5 ; date:12.2015
Nanoscale research letters ; 10, Heft 1 (31.1.2015), 1-5, 12.2015

Creator
Zhang, Xun
Chen, Lin
Sun, Qing-Qing
Wang, Lu-Hao
Zhou, Peng
Lu, Hong-Liang
Wang, Peng-Fei
Ding, Shi-Jin
Zhang, David Wei
Contributor
SpringerLink (Online service)

DOI
10.1186/s11671-014-0711-4
URN
urn:nbn:de:101:1-2021080710564959481451
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 11:02 AM CEST

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Associated

  • Zhang, Xun
  • Chen, Lin
  • Sun, Qing-Qing
  • Wang, Lu-Hao
  • Zhou, Peng
  • Lu, Hong-Liang
  • Wang, Peng-Fei
  • Ding, Shi-Jin
  • Zhang, David Wei
  • SpringerLink (Online service)

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