Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application ; volume:10 ; number:1 ; day:31 ; month:1 ; year:2015 ; pages:1-5 ; date:12.2015
Nanoscale research letters ; 10, Heft 1 (31.1.2015), 1-5, 12.2015
- Creator
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Zhang, Xun
Chen, Lin
Sun, Qing-Qing
Wang, Lu-Hao
Zhou, Peng
Lu, Hong-Liang
Wang, Peng-Fei
Ding, Shi-Jin
Zhang, David Wei
- Contributor
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SpringerLink (Online service)
- DOI
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10.1186/s11671-014-0711-4
- URN
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urn:nbn:de:101:1-2021080710564959481451
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 11:02 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Zhang, Xun
- Chen, Lin
- Sun, Qing-Qing
- Wang, Lu-Hao
- Zhou, Peng
- Lu, Hong-Liang
- Wang, Peng-Fei
- Ding, Shi-Jin
- Zhang, David Wei
- SpringerLink (Online service)