Visualizing In‐Plane Junctions in Nitrogen‐Doped Graphene
Abstract: Controlling the spatial distribution of dopants in graphene is the gateway to the realization of graphene‐based electronic components. Here, it is shown that a submonolayer of self‐assembled physisorbed molecules can be used as a resist during a post‐synthesis nitrogen doping process to realize a nanopatterning of nitrogen dopants in graphene. The resulting formation of domains with different nitrogen concentrations allows obtaining n–n’ and p–n junctions in graphene. A scanning tunneling microscopy is used to measure the electronic properties of the junctions at the atomic scale and reveal their intrinsic width that is found to be ≈7 nm corresponding to a sharp junction regime.
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Visualizing In‐Plane Junctions in Nitrogen‐Doped Graphene ; day:08 ; month:09 ; year:2022 ; extent:8
Advanced functional materials ; (08.09.2022) (gesamt 8)
- Creator
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Bouatou, Mehdi
Chacon, Cyril
Lorentzen, Aleksander Bach
Ngo, Huu Thoai
Girard, Yann
Repain, Vincent
Bellec, Amandine
Rousset, Sylvie
Brandbyge, Mads
Dappe, Yannick J.
Lagoute, Jérôme
- DOI
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10.1002/adfm.202208048
- URN
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urn:nbn:de:101:1-2022090815264861894266
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:31 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Bouatou, Mehdi
- Chacon, Cyril
- Lorentzen, Aleksander Bach
- Ngo, Huu Thoai
- Girard, Yann
- Repain, Vincent
- Bellec, Amandine
- Rousset, Sylvie
- Brandbyge, Mads
- Dappe, Yannick J.
- Lagoute, Jérôme