Screen-printed Al-alloyed rear junction solar cell concept applied to very thin (100 μm) large-area n-type Si wafers
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Energy Procedia ; 27 (2012). - S. 460-466. - ISSN 1876-6102. - eISSN 1876-6102
- Classification
-
Astronomie, Kartographie
- Event
-
Veröffentlichung
- (where)
-
Konstanz
- (who)
-
Bibliothek der Universität Konstanz
- (when)
-
2013
- Creator
- URN
-
urn:nbn:de:bsz:352-227500
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:48 PM CET
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Schiele, Yvonne
- Book, Felix
- Seren, Sven
- Hahn, Giso
- Terheiden, Barbara
- Bibliothek der Universität Konstanz
Time of origin
- 2013
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Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells
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Role of thermal SiO<sub>2</sub> on passivation of highly doped layer
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Influence of rear side coating on emitter formation during POCL<sub>3</sub> diffusion process
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Passivation of Si wafers by Al2O3 films with different surface conditioning
Design considerations for industrial rear passivated solar cells
Diffusion-based model of local Al back surface field formation for industrial passivated emitter and rear cell solar cells
Comparison of bifacial and monofacial large-area n-type Si solar cells from 100 μm thin wire-sawn wafers
Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells
Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications
Role of thermal SiO<sub>2</sub> on passivation of highly doped layer
Investigation of radiation damage to the Al2O3
Influence of rear side coating on emitter formation during POCL<sub>3</sub> diffusion process
Entwicklung und Charakterisierung neuartiger Hochleistungssolarzellen
Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells
Void formation on PERC solar cells and their impact on the electrical cell parameters verified by luminescence and scanning acoustic microscope measurements
Passivation of Si wafers by Al2O3 films with different surface conditioning
Design considerations for industrial rear passivated solar cells
Diffusion-based model of local Al back surface field formation for industrial passivated emitter and rear cell solar cells
Comparison of bifacial and monofacial large-area n-type Si solar cells from 100 μm thin wire-sawn wafers
Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells
Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications
Role of thermal SiO<sub>2</sub> on passivation of highly doped layer
Investigation of radiation damage to the Al2O3
Influence of rear side coating on emitter formation during POCL<sub>3</sub> diffusion process
Entwicklung und Charakterisierung neuartiger Hochleistungssolarzellen
Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells