Dynamic photomask directed lithography based on electrically stimulated nematic liquid crystal architectures
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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1 Online-Ressource.
- Sprache
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Englisch
- Erschienen in
-
Dynamic photomask directed lithography based on electrically stimulated nematic liquid crystal architectures ; volume:15 ; number:1 ; day:30 ; month:10 ; year:2024 ; pages:1-10 ; date:12.2024
Nature Communications ; 15, Heft 1 (30.10.2024), 1-10, 12.2024
- Klassifikation
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Elektrotechnik, Elektronik
- Urheber
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Liu, Mengjun
Yang, Ruizhi
Guo, Zhenghao
Chen, Kexu
Feng, Haoqiang
Lu, Han
Huang, Shijian
Zhang, Minmin
Ye, Huapeng
Shui, Lingling
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
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10.1038/s41467-024-53530-9
- URN
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urn:nbn:de:101:1-2501192124582.031537660418
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:22 MESZ
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Beteiligte
- Liu, Mengjun
- Yang, Ruizhi
- Guo, Zhenghao
- Chen, Kexu
- Feng, Haoqiang
- Lu, Han
- Huang, Shijian
- Zhang, Minmin
- Ye, Huapeng
- Shui, Lingling
- SpringerLink (Online service)
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