Facile Resist‐Free Nanopatterning of Monolayers of MoS 2 by Focused Ion‐Beam Milling
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Facile Resist‐Free Nanopatterning of Monolayers of MoS 2 by Focused Ion‐Beam Milling ; volume:7 ; number:19 ; year:2020 ; extent:9
Advanced materials interfaces ; 7, Heft 19 (2020) (gesamt 9)
- Urheber
- DOI
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10.1002/admi.202000858
- URN
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urn:nbn:de:101:1-2022052811595582601437
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:28 MESZ
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