Effect of rapid thermal annealing on structural and optical properties of ZnS thin films fabricated by RF magnetron sputtering technique
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2251-7235
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Effect of rapid thermal annealing on structural and optical properties of ZnS thin films fabricated by RF magnetron sputtering technique ; volume:14 ; number:1 ; day:2 ; month:12 ; year:2019 ; pages:53-63 ; date:3.2020
Journal of theoretical and applied physics ; 14, Heft 1 (2.12.2019), 53-63, 3.2020
- Creator
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Bashar, M. S.
Matin, Rummana
Sultana, Munira
Siddika, Ayesha
Rahaman, M.
Gafur, M. A.
Ahmed, F.
- Contributor
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SpringerLink (Online service)
- DOI
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10.1007/s40094-019-00361-5
- URN
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urn:nbn:de:101:1-2020051021053932351090
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:58 AM CEST
Data provider
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Associated
- Bashar, M. S.
- Matin, Rummana
- Sultana, Munira
- Siddika, Ayesha
- Rahaman, M.
- Gafur, M. A.
- Ahmed, F.
- SpringerLink (Online service)
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Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
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Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
Comparison of magnetron sputtering and ion beam sputtering on dispersive mirrors
Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment
Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
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Exploring the potential of serial magnetron co-sputtering
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