TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes ; volume:15 ; year:2024 ; pages:1-12
Beilstein journal of nanotechnology ; 15 (2024), 1-12

Creator
Williams, Joshua
Faley, Michael I.
Vas, Joseph Vimal
Lu, Peng-Han
Dunin-Borkowski, Rafal E.

DOI
10.3762/bjnano.15.1
URN
urn:nbn:de:101:1-2409261220185.050530842536
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:21 AM CEST

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