- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Intercalation of Si between MoS2 layers ; volume:8 ; pages:1952-1960
Beilstein journal of nanotechnology ; 8, 1952-1960
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.8.196
- URN
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urn:nbn:de:101:1-2018090711225491376482
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:20 MESZ
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