Optimization of annealing of dopant to increase sharpness of p–n junctions in a heterostructure with drain of dopant
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2190-5517
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Optimization of annealing of dopant to increase sharpness of p–n junctions in a heterostructure with drain of dopant ; volume:4 ; number:5 ; day:15 ; month:5 ; year:2013 ; pages:537-541 ; date:6.2014
Applied nanoscience ; 4, Heft 5 (15.5.2013), 537-541, 6.2014
- Urheber
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Pankratov, E. L.
- Beteiligte Personen und Organisationen
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Bulaeva, E. A.
SpringerLink (Online service)
- DOI
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10.1007/s13204-013-0228-7
- URN
-
urn:nbn:de:1111-2016052024909
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
- 14.08.2025, 10:55 MESZ
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Beteiligte
- Pankratov, E. L.
- Bulaeva, E. A.
- SpringerLink (Online service)
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