The Chemical Vapor Deposition (CVD) of Refractory Metal Carbides

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
The Chemical Vapor Deposition (CVD) of Refractory Metal Carbides ; volume:11 ; number:1-4 ; year:1993 ; pages:239-246
High temperature materials and processes ; 11, Heft 1-4 (1993), 239-246

Creator
Pierson,, H.O.

DOI
10.1515/HTMP.1993.11.1-4.239
URN
urn:nbn:de:101:1-2501260444003.169329523462
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:37 AM CEST

Data provider

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Associated

  • Pierson,, H.O.

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