Interfacial Oxide Formation Limits the Photovoltage of α‐SnWO 4 /NiO x Photoanodes Prepared by Pulsed Laser Deposition
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Interfacial Oxide Formation Limits the Photovoltage of α‐SnWO 4 /NiO x Photoanodes Prepared by Pulsed Laser Deposition ; year:2021
Advanced energy materials ; (2021)
- Urheber
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Schnell, Patrick
Kölbach, Moritz
Schleuning, Markus
Obata, Keisuke
Irani, Rowshanak
Ahmet, Ibbi Y.
Harb, Moussab
Starr, David E.
Krol, Roel van de
Abdi, Fatwa
- DOI
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10.1002/aenm.202003183
- URN
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urn:nbn:de:101:1-2021020408421077424774
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:37 MESZ
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Beteiligte
- Schnell, Patrick
- Kölbach, Moritz
- Schleuning, Markus
- Obata, Keisuke
- Irani, Rowshanak
- Ahmet, Ibbi Y.
- Harb, Moussab
- Starr, David E.
- Krol, Roel van de
- Abdi, Fatwa
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