Nanostructured Silicon Matrix for Materials Engineering

Abstract: Tin‐containing layers with different degrees of oxidation are uniformly distributed along the length of silicon nanowires formed by a top‐down method by applying metalorganic chemical vapor deposition. The electronic and atomic structure of the obtained layers is investigated by applying nondestructive surface‐sensitive X‐ray absorption near edge spectroscopy using synchrotron radiation. The results demonstrated, for the first time, a distribution effect of the tin‐containing phases in the nanostructured silicon matrix compared to the results obtained for planar structures at the same deposition temperatures. The amount and distribution of tin‐containing phases can be effectively varied and controlled by adjusting the geometric parameters (pore diameter and length) of the initial matrix of nanostructured silicon. Due to the occurrence of intense interactions between precursor molecules and decomposition by‐products in the nanocapillary, as a consequence of random thermal motion of molecules in the nanocapillary, which leads to additional kinetic energy and formation of reducing agents, resulting in effective reduction of tin‐based compounds to a metallic tin state for molecules with the highest penetration depth in the nanostructured silicon matrix. This effect will enable clear control of the phase distributions of functional materials in 3D matrices for a wide range of applications.

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Nanostructured Silicon Matrix for Materials Engineering ; day:15 ; month:01 ; year:2023 ; extent:8
Small ; (15.01.2023) (gesamt 8)

Creator
Liu, Poting
Schleusener, Alexander
Zieger, Gabriel
Bochmann, Arne
van Spronsen, Matthijs A.
Sivakov, Vladimir

DOI
10.1002/smll.202206318
URN
urn:nbn:de:101:1-2023011614165009291087
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:38 AM CEST

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Associated

  • Liu, Poting
  • Schleusener, Alexander
  • Zieger, Gabriel
  • Bochmann, Arne
  • van Spronsen, Matthijs A.
  • Sivakov, Vladimir

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