All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
All‐Around Universal and Photoelastic Self‐Healing Elastomer with High Toughness and Resilience ; day:18 ; month:10 ; year:2021 ; extent:12
Advanced science ; (18.10.2021) (gesamt 12)

Creator
Tolvanen, Jarkko
Nelo, Mikko
Hannu, Jari
Juuti, Jari
Jantunen, Heli

DOI
10.1002/advs.202103235
URN
urn:nbn:de:101:1-2021101915135057391807
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.04.0020, 2:36 PM CET

Data provider

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Associated

  • Tolvanen, Jarkko
  • Nelo, Mikko
  • Hannu, Jari
  • Juuti, Jari
  • Jantunen, Heli

Other Objects (12)