High Aspect Ratio Nanotubes fabricated by Ion-Track Technology and Atomic Layer Deposition

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Notes: In: Scientific Report / GSI Helmholtzzentrum für Schwerionenforschung, Darmstadt ; 2014-1

Event: Veröffentlichung

(where): Darmstadt

(who): Universitäts- und Landesbibliothek

(when): 2024

Creator: Spende, A.
Alber, I.
Sobel, N.
Hess, Christian
Lukas, M.
Stühn, B.
Zierold, R.
Montero Moreno, Josep M.
Nielsch, Kornelius
Trautmann, Christina
Toimil Molares, M. E.

DOI: 10.26083/tuprints-00027291

URN: urn:nbn:de:tuda-tuprints-272910

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 25.03.2025, 1:44 PM CET

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Associated

Spende, A.
Alber, I.
Sobel, N.
Hess, Christian
Lukas, M.
Stühn, B.
Zierold, R.
Montero Moreno, Josep M.
Nielsch, Kornelius
Trautmann, Christina
Toimil Molares, M. E.
Universitäts- und Landesbibliothek

Time of origin

2024

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High Aspect Ratio Nanotubes fabricated by Ion-Track Technology and Atomic Layer Deposition

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Other Objects (12)

Atomic layer deposition of vanadium oxides on multi-walled carbon nanotubes

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Surface Modification of Etched Ion-Track Polymer Membranes by Atomic Layer Deposition

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Surface Modification of Etched Ion-Track Polymer Membranes by Atomic Layer Deposition

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Copper oxide atomic layer deposition on thermally pretreated multi-walled carbon nanotubes for interconnect applications

Metastable atomic layer deposition

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Chemistry of atomic layer deposition

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Surface Modification of Etched Ion-Track Polymer Membranes by Atomic Layer Deposition

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