Hochschulschrift
Plasma activated deposition of thin indium-thin-oxide (ITO) films
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
-
30 cm
- Umfang
-
76 Bl.
- Sprache
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Englisch
- Anmerkungen
-
Ill., graph. Darst.
Greifswald, Univ., Diss., 2001
- Schlagwort
-
Indiumoxide
Zinnoxide
Dünne Schicht
Magnetronsputtern
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 14:00 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
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