Epitaxy and thickness scaling of ferroelectric AlScN : towards next-generation memory and computing devices
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
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Kiel, Christian-Albrechts-Universität zu Kiel, Dissertation, 2024
- Schlagwort
-
Ferroelektrikum
FRAM
Dünne Schicht
Bismutverbindungen
Strontiumverbindungen
Tantalate
- Ereignis
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Veröffentlichung
- (wo)
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Kiel
- (wer)
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Universitätsbibliothek Kiel
- (wann)
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2024
- Urheber
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Schönweger, Georg Martin
- Beteiligte Personen und Organisationen
- URN
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urn:nbn:de:gbv:8:3-2024-00800-2
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:51 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Schönweger, Georg Martin
- Kohlstedt, Hermann
- Lofink, Fabian
- Ambacher, Oliver
- Universitätsbibliothek Kiel
Entstanden
- 2024
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