Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
-
Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth ; volume:9 ; number:1 ; day:11 ; month:7 ; year:2014 ; pages:1-9 ; date:12.2014
Nanoscale research letters ; 9, Heft 1 (11.7.2014), 1-9, 12.2014
- Creator
-
Karim, Marwa
Martini, Roberto
Radhakrishnan, Hariharsudan Sivaramakrishnan
van Nieuwenhuysen, Kris
Depauw, Valerie
Ramadan, Wedgan
Gordon, Ivan
Poortmans, Jef
- Contributor
-
SpringerLink (Online service)
- DOI
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10.1186/1556-276X-9-348
- URN
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urn:nbn:de:101:1-2019080302565368142596
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:37 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Karim, Marwa
- Martini, Roberto
- Radhakrishnan, Hariharsudan Sivaramakrishnan
- van Nieuwenhuysen, Kris
- Depauw, Valerie
- Ramadan, Wedgan
- Gordon, Ivan
- Poortmans, Jef
- SpringerLink (Online service)
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