Combinatorial Optimization of Metal‐Insulator‐Insulator‐Metal (MIIM) Diodes With Thickness‐Gradient Films via Spatial Atomic Layer Deposition
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Combinatorial Optimization of Metal‐Insulator‐Insulator‐Metal (MIIM) Diodes With Thickness‐Gradient Films via Spatial Atomic Layer Deposition ; day:17 ; month:09 ; year:2024 ; extent:10
Advanced electronic materials ; (17.09.2024) (gesamt 10)
- Urheber
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Alshehri, Abdullah H.
Asgarimoghaddam, Hatameh
Delumeau, Louis‐Vincent
Nguyen, Viet Huong
Ali, AlRasheed
Aljaghtham, Mutabe
Alamry, Ali
Ozyigit, Dogu
Yavuz, Mustafa
Musselman, Kevin P.
- DOI
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10.1002/aelm.202400093
- URN
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urn:nbn:de:101:1-2409171426057.951909449122
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:20 MESZ
Datenpartner
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Beteiligte
- Alshehri, Abdullah H.
- Asgarimoghaddam, Hatameh
- Delumeau, Louis‐Vincent
- Nguyen, Viet Huong
- Ali, AlRasheed
- Aljaghtham, Mutabe
- Alamry, Ali
- Ozyigit, Dogu
- Yavuz, Mustafa
- Musselman, Kevin P.
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