Low Thermal Resistance of Diamond‐AlGaN Interfaces Achieved Using Carbide Interlayers
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Low Thermal Resistance of Diamond‐AlGaN Interfaces Achieved Using Carbide Interlayers ; day:22 ; month:10 ; year:2024 ; extent:9
Advanced materials interfaces ; (22.10.2024) (gesamt 9)
- Urheber
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Aller, Henry T.
Pfeifer, Thomas W.
Mamun, Abdullah
Huynh, Kenny
Tadjer, Marko
Feygelson, Tatyana
Hobart, Karl
Anderson, Travis
Pate, Bradford
Jacobs, Alan
Lundh, James Spencer
Goorsky, Mark
Khan, Asif
Hopkins, Patrick
Graham, Samuel
- DOI
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10.1002/admi.202400575
- URN
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urn:nbn:de:101:1-2410231430433.956846553417
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:28 MESZ
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Beteiligte
- Aller, Henry T.
- Pfeifer, Thomas W.
- Mamun, Abdullah
- Huynh, Kenny
- Tadjer, Marko
- Feygelson, Tatyana
- Hobart, Karl
- Anderson, Travis
- Pate, Bradford
- Jacobs, Alan
- Lundh, James Spencer
- Goorsky, Mark
- Khan, Asif
- Hopkins, Patrick
- Graham, Samuel
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