Influence of Cobalt and Cobalt–Manganese Oxide Coating Thickness Deposited by DLI-MOCVD as a Barrier Against Cr Diffusion for SOC Interconnect
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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1 Online-Ressource.
- Sprache
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Englisch
- Erschienen in
-
Influence of Cobalt and Cobalt–Manganese Oxide Coating Thickness Deposited by DLI-MOCVD as a Barrier Against Cr Diffusion for SOC Interconnect ; volume:101 ; number:6 ; day:23 ; month:9 ; year:2024 ; pages:1467-1478 ; date:12.2024
High temperature corrosion of materials ; 101, Heft 6 (23.9.2024), 1467-1478, 12.2024
- Klassifikation
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Elektrotechnik, Elektronik
- Urheber
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Chanson, R.
Bouvier, M.
Miserque, F.
Rouillard, F.
Schuster, F.
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
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10.1007/s11085-024-10316-0
- URN
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urn:nbn:de:101:1-2501222111227.695783421038
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:32 MESZ
Datenpartner
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Beteiligte
- Chanson, R.
- Bouvier, M.
- Miserque, F.
- Rouillard, F.
- Schuster, F.
- SpringerLink (Online service)
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