Influence of Cobalt and Cobalt–Manganese Oxide Coating Thickness Deposited by DLI-MOCVD as a Barrier Against Cr Diffusion for SOC Interconnect

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: 1 Online-Ressource.

Language: Englisch

Bibliographic citation: Influence of Cobalt and Cobalt–Manganese Oxide Coating Thickness Deposited by DLI-MOCVD as a Barrier Against Cr Diffusion for SOC Interconnect ; volume:101 ; number:6 ; day:23 ; month:9 ; year:2024 ; pages:1467-1478 ; date:12.2024
High temperature corrosion of materials ; 101, Heft 6 (23.9.2024), 1467-1478, 12.2024

Classification: Elektrotechnik, Elektronik

Creator: Chanson, R.
Bouvier, M.
Miserque, F.
Rouillard, F.
Schuster, F.

Contributor: SpringerLink (Online service)

DOI: 10.1007/s11085-024-10316-0

URN: urn:nbn:de:101:1-2501222111227.695783421038

Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.08.2025, 7:32 AM CEST

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Associated

Chanson, R.
Bouvier, M.
Miserque, F.
Rouillard, F.
Schuster, F.
SpringerLink (Online service)

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