Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2223-7704
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
-
online resource.
- Erschienen in
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Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry ; volume:1 ; number:4 ; day:23 ; month:11 ; year:2013 ; pages:359-366 ; date:12.2013
Friction ; 1, Heft 4 (23.11.2013), 359-366, 12.2013
- Urheber
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Zhang, Weitao
- Beteiligte Personen und Organisationen
-
Lei, Hong
SpringerLink (Online service)
- DOI
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10.1007/s40544-013-0032-0
- URN
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urn:nbn:de:1111-201609073219
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:59 MESZ
Datenpartner
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Beteiligte
- Zhang, Weitao
- Lei, Hong
- SpringerLink (Online service)
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