Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2223-7704
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Abrasive-free polishing of hard disk substrate with H2O2-C4H10O2-Na2S2O5 slurry ; volume:1 ; number:4 ; day:23 ; month:11 ; year:2013 ; pages:359-366 ; date:12.2013
Friction ; 1, Heft 4 (23.11.2013), 359-366, 12.2013

Creator
Zhang, Weitao
Contributor
Lei, Hong
SpringerLink (Online service)

DOI
10.1007/s40544-013-0032-0
URN
urn:nbn:de:1111-201609073219
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:59 AM CEST

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Associated

  • Zhang, Weitao
  • Lei, Hong
  • SpringerLink (Online service)

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