- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
Optimization of Activation Annealing Condition for Boron‐Implanted Diamond ; day:22 ; month:08 ; year:2023 ; extent:6
Physica status solidi / A. A, Applications and materials science ; (22.08.2023) (gesamt 6)
- Creator
-
Seki, Yuhei
Kurashima, Rintaro
Yoshihara, Minami
Hoshino, Yasushi
- DOI
-
10.1002/pssa.202300522
- URN
-
urn:nbn:de:101:1-2023082315193402187014
- Rights
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:50 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Seki, Yuhei
- Kurashima, Rintaro
- Yoshihara, Minami
- Hoshino, Yasushi
Other Objects (12)
Thermal annealing of implanted 252 Cf fission tracks in monazite
Thermal Annealing of Implanted 252 Cf Fission-1 Tracks in Monazite
Modeling of Annealing Processes for Ion-Implanted Single-Crystalline Silicon Solar Cells
Heteroepitaxial boron-doped diamond: from synthesis to application
Coherence time improvement of shallow implanted nitrogen-vacancy centers in diamond
Modeling boron profiles in silicon after pulsed excimer laser annealing
Spatial redistribution of boron implanted into Poly-(Di-n-Hexyl Silane), (PDHSi)
Electrodeposition of cuprous oxide on boron doped diamond electrodes
Effect of Annealing on Microstructures and Hardening of Helium-Hydrogen-Implanted Sequentially Vanadium Alloys
Ripple pyrometry during millisecond annealing on shallow Boron-doped Silicon wafers
Simulation of friction between diamond and polycrystalline cubic boron nitride
Use of Boron‐Doped Diamond Electrodes in Electro‐Organic Synthesis
Thermal annealing of implanted 252 Cf fission tracks in monazite
Thermal Annealing of Implanted 252 Cf Fission-1 Tracks in Monazite
Modeling of Annealing Processes for Ion-Implanted Single-Crystalline Silicon Solar Cells
Heteroepitaxial boron-doped diamond: from synthesis to application
Coherence time improvement of shallow implanted nitrogen-vacancy centers in diamond
Modeling boron profiles in silicon after pulsed excimer laser annealing
Spatial redistribution of boron implanted into Poly-(Di-n-Hexyl Silane), (PDHSi)
Electrodeposition of cuprous oxide on boron doped diamond electrodes
Effect of Annealing on Microstructures and Hardening of Helium-Hydrogen-Implanted Sequentially Vanadium Alloys
Ripple pyrometry during millisecond annealing on shallow Boron-doped Silicon wafers
Simulation of friction between diamond and polycrystalline cubic boron nitride
Use of Boron‐Doped Diamond Electrodes in Electro‐Organic Synthesis
Thermal annealing of implanted 252 Cf fission tracks in monazite
Thermal Annealing of Implanted 252 Cf Fission-1 Tracks in Monazite
Modeling of Annealing Processes for Ion-Implanted Single-Crystalline Silicon Solar Cells
Heteroepitaxial boron-doped diamond: from synthesis to application
Coherence time improvement of shallow implanted nitrogen-vacancy centers in diamond
Modeling boron profiles in silicon after pulsed excimer laser annealing
Spatial redistribution of boron implanted into Poly-(Di-n-Hexyl Silane), (PDHSi)
Electrodeposition of cuprous oxide on boron doped diamond electrodes
Effect of Annealing on Microstructures and Hardening of Helium-Hydrogen-Implanted Sequentially Vanadium Alloys
Ripple pyrometry during millisecond annealing on shallow Boron-doped Silicon wafers
Simulation of friction between diamond and polycrystalline cubic boron nitride