Polyhedral oligomeric silsesquioxane (POSS)-modified phenolic resin: Synthesis and anti-oxidation properties

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Polyhedral oligomeric silsesquioxane (POSS)-modified phenolic resin: Synthesis and anti-oxidation properties ; volume:21 ; number:1 ; year:2021 ; pages:316-326 ; extent:11
e-Polymers ; 21, Heft 1 (2021), 316-326 (gesamt 11)

Creator
Wang, Bing
Shi, Minxian
Ding, Jie
Huang, Zhixiong

DOI
10.1515/epoly-2021-0031
URN
urn:nbn:de:101:1-2412151649390.162225286779
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:36 AM CEST

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Associated

  • Wang, Bing
  • Shi, Minxian
  • Ding, Jie
  • Huang, Zhixiong

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