- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
-
Epitaxial growth of SiGe films by annealing Al–Ge alloyed pastes on Si substrate ; volume:12 ; number:1 ; day:12 ; month:9 ; year:2022 ; pages:1-11 ; date:12.2022
Scientific reports ; 12, Heft 1 (12.9.2022), 1-11, 12.2022
- Creator
-
Fukuda, Keisuke
Miyamoto, Satoru
Nakahara, Masahiro
Suzuki, Shota
Dhamrin, Marwan
Maeda, Kensaku
Fujiwara, Kozo
Uraoka, Yukiharu
Usami, Noritaka
- Contributor
-
SpringerLink (Online service)
- DOI
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10.1038/s41598-022-19122-7
- URN
-
urn:nbn:de:101:1-2022111721132040891667
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:36 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Fukuda, Keisuke
- Miyamoto, Satoru
- Nakahara, Masahiro
- Suzuki, Shota
- Dhamrin, Marwan
- Maeda, Kensaku
- Fujiwara, Kozo
- Uraoka, Yukiharu
- Usami, Noritaka
- SpringerLink (Online service)