CVD Diamond Coating on Al-Interlayered FeCoNi Alloy Substrate: An Interfacial Study

Abstract: In this study, an Al thin film interlayer of 80 nm thick has been applied on FeCoNi alloy substrate which possesses a low coefficient of thermal expansion, to enhance the interfacial adhesion of diamond films produced by microwave plasma-enhanced chemical vapor deposition. Characterization of the top deposit, interlayer and the underlying substrate was performed by Raman spectroscopy, energy dispersive X-ray analysis, X-ray photoelectronic spectroscopy, X-scanning electron microscopy and X-ray diffraction. The Al interlayer has effectively inhibited the formation of graphitic carbon and markedly enhanced the nucleation, growth and adhesion of diamond films. The beneficial role Al plays is primarily attributed to the formation of an alumina barrier layer on the substrate surface, as verified by interfacial analysis.

Object Details

• Location: Deutsche Nationalbibliothek Frankfurt am Main
• Extent: Online-Ressource
• Language: Englisch

References and Relationships

• Bibliographic citation: CVD Diamond Coating on Al-Interlayered FeCoNi Alloy Substrate: An Interfacial Study ; volume:34 ; number:8 ; year:2015 ; pages:799-804 ; extent:6 ; High temperature materials and processes ; 34, Heft 8 (2015), 799-804 (gesamt 6)

Contributors, Places and Time

• Creator: Li, Y.S. ; Sun, X.Y. ; Yang, L.Z. ; Kurmaev, E.Z. ; Yang, Q.

Further information

• DOI: 10.1515/htmp-2014-0132
• URN: urn:nbn:de:101:1-2501270536008.537281607809
• Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
• Last update: 15.08.2025, 7:26 AM CEST