Conformal Low‐Temperature Molecular Layer Deposited Coatings as Interface Modifications to Support Ceramic Protective Films on Macroscopic Flexible Devices

Flexible devices often need a protective coating when operating in harmful environments, ranging from mild ambient conditions to a biologically active environment of the human body. The flexibility poses a problem for traditional encapsulation solutions, as those make the device bulky and limit functionality by applying an external casing. Alternatively, fully conformal encapsulation of a device of arbitrary shape can be realized with thin‐film encapsulation (TFE) without altering device dimensions. Yet, TFE is susceptible to fail under mechanical stresses, especially when a hard ceramic coating is applied on a polymer. Reliability of TFE can be enhanced by altering the elasticity of the hard and brittle thin films, by adding softer layers in between sample and barrier. Herein, molecular layer deposited (MLD) metal‐linked trioxysilylheptanoate (M‐TOSH) films are studied for coating of large devices to conformally and uniformly tune the interface between polymer and atomic‐layer‐deposited protective film. The results show that M‐TOSH process scales to large chambers; parameter optimization leads to superior film quality and lowers elastic modulus. Conformality, tested with home‐built macroscopic test device, finds the process suitable for 3D parts. Final testing reveals that ten cycles of MLD interlayer double the crack‐onset‐strain from 0.26% to 0.51%.

Object Details

• Location: Deutsche Nationalbibliothek Frankfurt am Main
• Extent: Online-Ressource
• Language: Englisch

References and Relationships

• Bibliographic citation: Conformal Low‐Temperature Molecular Layer Deposited Coatings as Interface Modifications to Support Ceramic Protective Films on Macroscopic Flexible Devices ; day:28 ; month:05 ; year:2024 ; extent:13 ; Advanced engineering materials ; (28.05.2024) (gesamt 13)

Contributors, Places and Time

• Creator: Kalliomäki, Jesse ; Manninen, Ilkka ; Ritasalo, Riina ; Hirsjärvi, Samuli

Further information

• DOI: 10.1002/adem.202302257
• URN: urn:nbn:de:101:1-2405291420153.466396468281
• Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
• Last update: 14.08.2025, 10:53 AM CEST